ARTEMYEV, Vladimir et al.
Use of computer modeling for defect engineering in Czochralski silicon growth.
Journal of Power Technologies, [S.l.], v. 99, n. 2, p. 163–169, july 2019.
ISSN 2083-4195.
Available at: <https://papers.itc.pw.edu.pl/index.php/JPT/article/view/1436>. Date accessed: 22 dec. 2024.